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PLASMA CHEMISTRY AND PLASMA PROCESSING

期刊標題檢索 PLASMA CHEM PLA 最新評論: It's been a month, and there's been no news... Is this normal?? (2024-03-18)


期刊名稱:   ISSN:   主題領域:   影響因子範圍: -
索引:   類別:   開放訪問:   排序方式:

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期刊簡介
期刊名稱PLASMA CHEMISTRY AND PLASMA PROCESSING PLASMA CHEMISTRY AND PLASMA PROCESSING
LetPub Score
6.6
50 ratings
Rate

Reputation
7.5

Influence
5.2

Speed
9.5

期刊簡稱PLASMA CHEM PLASMA P
ISSN0272-4324
E-ISSN1572-8986
h-index57
CiteScore
CiteScoreSJRSNIPCiteScore Rank
5.900.4800.912
Subject fieldQuartilesRankPercentile
Category: Physics and Astronomy
Subcategory: Condensed Matter Physics
Q1108 / 434
Category: Physics and Astronomy
Subcategory: Surfaces, Coatings and Films
Q234 / 132
Category: Physics and Astronomy
Subcategory: General Chemical Engineering
Q279 / 273
Category: Physics and Astronomy
Subcategory: General Chemistry
Q2119 / 408

自引率 (2023-2024)19.20%自引率趨勢
掲載範囲
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
官方網站https://www.springer.com/11090
在線稿件提交https://mc.manuscriptcentral.com/pcpp
開放訪問No
出版商Springer US
主題領域工程技术
出版國/地區UNITED STATES
發行頻率四半期刊行
創刊年1981
每年文章數123每年文章數趨勢
黃金OA百分比14.18%
Web of Science 四分位
2023-2024
WOS Quartile: Q2

CategoryEditionJIF QuartileJIF RankingJIF Percentage
ENGINEERING, CHEMICALSCIEQ391/170
PHYSICS, APPLIEDSCIEQ281/179
PHYSICS, FLUIDS & PLASMASSCIEQ212/40
索引 (SCI or SCIE)Science Citation Index
Science Citation Index Expanded
鏈接到PubMed Central (PMC)https://www.ncbi.nlm.nih.gov/nlmcatalog?term=0272-4324%5BISSN%5D
平均審稿時間 *來自出版商的數據:
來自作者的數據: Slow, 6-12 Week(s)
競爭力 *來自作者的數據: Moderate
參考鏈接
相關期刊 【PLASMA CHEMISTRY AND PLASMA PROCESSING】CiteScore趨勢
自引率趨勢 每年文章數趨勢
作者評論
*所有的審稿過程指標,如接受率和審稿速度,僅限於用戶提交的稿件。因此,這些指標可能無法準確反映期刊的競爭力或速度。
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    學科內的可信期刊 影響因子
    Energy & Environmental ScienceH-index: 279

    CiteScore: 50.50
    PROGRESS IN ENERGY AND COMBUSTION SCIENCEH-index: 161

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    Chemical Engineering JournalH-index: 172

    CiteScore: 21.70
    APPLIED ENERGYH-index: 162

    CiteScore: 21.20
    DESALINATIONH-index: 155

    CiteScore: 14.60
    SEPARATION AND PURIFICATION TECHNOLOGYH-index: 144

    CiteScore: 14.00
    FUEL PROCESSING TECHNOLOGYH-index: 125

    CiteScore: 13.20
    PROCESS SAFETY AND ENVIRONMENTAL PROTECTIONH-index: 58

    CiteScore: 11.40
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    POWDER TECHNOLOGY565423
    CHEMICAL ENGINEERING SCIENCE503713
  •  

    PLASMA CHEMISTRY AND PLASMA PROCESSING PLASMA CHEMISTRY AND PLASMA PROCESSING
    明年預測:
    穩步上升 無變化 逐步下降  刷新
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  [PLASMA CHEMISTRY AND PLASMA PROCESSING] 的評論撰寫評論
作者: baronr


領域: 环境科学与生态学
審稿時間: 0.0 month(s)
結果: 待定&不明


撰寫評論

2024-03-18 20:48:55 評論於
It's been a month, and there's been no news... Is this normal??
(0) 讚! | baronr

作者: 止水321


領域: 工程技术
審稿時間: 2.0 month(s)
結果: 修改後接受


撰寫評論

2023-05-29 09:55:04 評論於
I was lucky enough to get one published, which took a year from submission to acceptance and went through three rounds of revisions. The journal is very rigorous and responsible. It is an established journal in the field of plasma, but it doesn't have a high publication volume. Its impact factor and ranking are slightly lower, and it has a lower cost-effectiveness ratio. The reason I submitted to this journal was more because of a kind of sentiment.
(0) 讚! | 止水321

作者: xin


領域: 工程技术
審稿時間: 1.0 month(s)
結果: 修改後接受


撰寫評論

2021-12-28 16:40:59 評論於
Assigned to Engineering and Technology Zone 4, I don't know what it means. The journal title is clearly related to plasma processing, so it can't be randomly played, right?
(1) 讚! | xin

作者: xin


領域: 工程技术
審稿時間: 1.0 month(s)
結果: 修改後接受


撰寫評論

2021-11-01 10:52:38 評論於
Old and prestigious journal, a top journal in the field of plasma processing, only publishes one volume per year, with only about 85 papers accepted. There was one year when they only accepted 72 papers.

It was founded by the late Professor Pfender from the Department of Mechanical Engineering at the University of Minnesota.

Many influential and remarkable papers from predecessors have been published in this journal, showing respect...

The initiator, Chinese Academy of Sciences classification system!!!
(18) 讚! | xin

作者: 6666777


領域: 工程技术
審稿時間: 1.0 month(s)
結果: 修改後接受


撰寫評論

2020-05-26 21:22:16 評論於
An established journal, and the top journal in the field of plasma processing. Only one volume is published per year, with only about 85 papers, and even only 72 one year. The reviewer used these words “high prestigious journals such as Plasma Chemistry and Plasma Processing”. It was founded by the late Professor Pfender, from Department of Mechanical Engineering at the University of Minnesota. A large number of predecessor’s excellent papers have been published in this journal. It is very respectable.

(1) 讚! | 6666777

作者: 匿名


領域:
審稿時間: 0.0 month(s)
結果:


撰寫評論

2013-07-11 08:54:00 評論於
This is very good journal, the editor and reviewers are very thorough; the review comments are also very constructive, highly recommended.

(0) 讚! | 匿名

作者: 匿名


領域:
審稿時間: 0.0 month(s)
結果:


撰寫評論

2012-10-11 11:07:00 評論於
A good journal, the editor is very good.
(0) 讚! | 匿名

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